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Nanoscience and Nanotechnology Letters
ISSN: 1941-4900 (Print); EISSN: 1941-4919 (Online)
Copyright © 2000- American Scientific Publishers. All Rights Reserved.

EDITORIAL BOARD
 
EDITOR-IN-CHIEF
Prof. Sam Zhang
School of Mechanical and Aerospace Engineering
Nanyang Technological University
50 Nanyang Avenue, Singapore 639798
Phone: +65-6790-4400
Fax: +65-6791-1859; 6792-4062
E-mail: MSYZhang@ntu.edu.sg
 
AMERICAN EDITOR
Dr. Anupama B. Kaul
Jet Propulsion Laboratory
California Institute of Technology
4800 Oak Grove Drive
Pasadena, California 91109, USA
Phone: (818) 393-7186
Fax: (818) 393-6047
 
ASIAN EDITOR
Dr. Katsuhiko Ariga
World Premier International Research Center for Materials Nanoarchitectonics
National Institute for Materials Science
1-1 Namiki, Tsukuba, Ibaraki 305-0044, JAPAN
Phone: +81-29-860-4597
Fax: +81-29-860-4832
 
EUROPEAN EDITOR
Dr. Davide Barreca
Molecular Science and Technology Institute - National Council of Research (CNR)
C/o Department of Chemistry, Padova University
Via Marzolo 1, I-35131 Padova, ITALY
Phone: +39-049-8275170
Fax: +39-049-8275161
 
ASSOCIATE EDITORS
Harish C. Barshilia, CSIR-National Aerospace Laboratories, India.
Jose Luis, Endrino, Abengoa Research, Spain.
Goh, Gregory K. L., Institute of Materials Research and Engineering, Singapore.
Kaifu, Huo, Wuhan University of Science and Technology, China.
Srivastava, Suneel Kumar, Indian Institute of Technology Kharagpur, India.
Nezih Pala, Florida International University, USA.
S. N., Piramanayagam, Data Storage Institute, Singapore.
Yaogen, Shen, City University of Hong Kong, Hong Kong.
Daniel Tat Joo, Teo, Singapore Institute of Manufacturing Technology, Singapore
Hong Wang, Nanyang Technological University, Singapore
Dongfeng, XUE, Changchun Institute of Applied Chemistry Chinese Academy of Sciences, P. R. China.
Eui Hyeok, Yang, Stevens Institute of Technology, USA.
Fu, Richard Yongqing, University of the West of Scotland, UK.
Chueh, Yu-Lun, National Tsing-Hua University, Taiwan.
Hanshen, Zhang, Ph.D., Applied Materials, USA.
 
 
 

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